Direct fabrication of microrelief patterns by electron-beam exposure in Ag-As-S glasses

Applied Physics Letters

Volumn 70, Issue 6, 1997, Pages 779-781

  Yoshida, Norimitsu ^a   Tanaka, Keiji ^a  

^a HOKKAIDO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0038420301     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.118257     Document Type: Article

References (18)

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