|
|
Volumn 92, Issue , 2003, Pages 15-18
|
|
Behaviour of high-k dielectric materials with classical cleaning chemistries
a
|
|
Author keywords
Cleaning; High k
|
|
Indexed keywords
CLEANING;
CONTAMINATION;
ETCHING;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
POWDERS;
SEMICONDUCTOR DEVICE MANUFACTURE;
SILICON NITRIDE;
DIELECTRIC MATERIALS;
SEMICONDUCTOR DEVICES;
HIGH-K DIELECTRIC MATERIAL;
PARTICLE REMOVAL EFFICIENCY;
CLEANING CHEMISTRY;
ETCHING BEHAVIOR;
HIGH- K;
HIGH-K MATERIALS;
MANUFACTURING IS;
MEGASONICS;
PROCESS FLOWS;
DIELECTRIC MATERIALS;
HIGH-K DIELECTRIC;
|
|
EID: 0038407275
PISSN: 10120394
EISSN: None
Source Type: Book Series
DOI: 10.4028/www.scientific.net/ssp.92.15 Document Type: Conference Paper |
|
Times cited : (1)
|
|
References (0)
|
