Zone-Plate Array Lithography (ZPAL): A maskless fast-turn-around system for microoptic device fabrication

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4984, Issue , 2003, Pages 10-17

  Menon, Rajesh ^a   Gil, Darìo ^a   Carter, D J D ^b   Patel, Amil ^a   Smith, Henry I ^a  

^a USA   (United States)

^b CHARLES STARK DRAPER LABORATORY   (United States)

Author keywords

Diffractive; Lithography; Maskless; Microscopy; Zone plate

Indexed keywords

APPLICATION SPECIFIC INTEGRATED CIRCUITS; DIFFRACTIVE OPTICS; DYNAMIC RANDOM ACCESS STORAGE; FABRICATION; LARGE SCALE SYSTEMS; LITHOGRAPHY; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; MICROSCOPIC EXAMINATION; SEMICONDUCTOR DEVICE MANUFACTURE;

ZONE-PLATE ARRAY LITHOGRAPHY (ZPAL);

MICROOPTICS;

EID: 0038396133     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.477856     Document Type: Conference Paper

References (10)

1. P. J. Silverman, "The Intel lithography roadmap," Technology Journal, 2002. http://developer.intel.com/technology/itj/2002/volume06issue02/.
2. M. LaPedus, "$10 million photomask called possible by 2010," Electronic Engineering Times, Oct 2002.
3. E. Muzio, P. Seidel, G. Sheldon, and J. Canning, "An overview of the cost of ownership for optical lithography at the 100nm and 70nm generations," Semiconductor FabTech, 11th Edition, pp. 191-194, 1999.
4. H. I. Smith, "A proposal for maskless, zone-plate-array lithography," J. Vac. Sci. Technol. B. 14(6), pp. 4318-4322, Nov/Dec 1996.
5. D. J. D. Carter, D. Gil, R. Menon, M. K. Mondol, H. I. Smith, and E. H. Anderson, "Maskless parallel patterning with zone-plate-array lithography," J. Vac. Sci. Technol. B. 17(6), Nov/Dec 1999.
6. D. Gil, R. Menon, D. J. D. Carter, X. Tang, and H. I. Smith, "Parallel maskless optical lithography for prototyping, low-volume production, and research," J. Vac. Sci. Technol. B, Nov/Dec 2002.
7. A. G. Michette, Optical Systems for Soft X Rays, Plenum Press, 1986.
8. D. Gil, R. Menon, D. J. D. Carter, and H. I. Smith, "Lithographic patterning and confocal imaging with zone plates," J. Vac. Sci. Technol. B. 18(6), Nov/Dec 2000.
9. H. J. Tiziani, R. Achi, R. N. Kramer, and L. Wiegers, "Theoretical analysis of confocal microscopy with microlenses," Applied Optics 35(1), pp. 120-125, Jan 1996.
10. J. Ferrera, V. Wong, S. Rishton, V. Boegli, E. Anderson, D. Kern, and H. Smith, "Spatial-phase-locked electron-beam lithography: Initial test results," J. Vac. Sci. Technol. B 11, pp. 2342-2345, 1993.