A fly's eye condenser system for uniform illumination

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4832, Issue , 2002, Pages 302-310

  Crowther, Blake G ^a   Koch, Donald G ^b   Kunick, Joseph M ^a   McGuire, James P ^a   Harned, Robert ^c   Gontin, Rick ^c  

^a OPTICAL RESEARCH ASSOCIATES   (United States)

^b DGK Optical Design and Eng Inc   (United States)

^c ASML US Inc   (United States)

Author keywords

Condenser; EUV; Fly's eye; Illuminator

Indexed keywords

LENSES; LIGHTING; OPTICAL SYSTEMS; PHOTOLITHOGRAPHY; ULTRAVIOLET RADIATION;

FLY EYE CONDENSER SYSTEM; INCIDENT IRRADIANCE; UNIFORM ILLUMINATION;

OPTICAL DESIGN;

EID: 0038349625     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.486462     Document Type: Conference Paper

References (5)

1. Koch, D. G., McGuire, J. P., and Kunick, J. M., 2001, US Patent US 6,195,201 B1, Reflective fly's eye condenser for EUV lithography.
2. Komatsuda, H., 1999, European Patent EP 0 939 341 A2, Illumination system and exposure apparatus and method.
3. Schuster, K., Schultz, J., Dinger, U., and Wangler, J., 1999, European Patent EP 0 955 641, Illumination system, particularly for dep ultraviolet lithography.
4. Sweatt, W. C., 1994, US Patent US 5,361,292, condenser for illuminating a ring field.
5. Williamson, D.M., 1998., "Evolution of ring field systems in microlithography," Proc. SPIE Vol. 3482, pp. 369-376.