Electrical and optical properties in sputtered GaSe thin films

Surface and Coatings Technology

Volumn 169-170, Issue , 2003, Pages 620-623

  Ohyama, Masanori ^a   Fujita, Yasuhiko ^b  

^a TOKYO NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

^b TOKYO METROPOLITAN UNIVERSITY   (Japan)

Author keywords

Dark current; Optical absorption; Photocurrent; Sputtered GaSe films

Indexed keywords

AMORPHOUS FILMS; ELECTRIC CONDUCTIVITY; ELECTRIC PROPERTIES; LIGHT ABSORPTION; OPTICAL PROPERTIES; PHOTOCURRENTS; POLYCRYSTALLINE MATERIALS; SILICA; SPUTTER DEPOSITION; THIN FILMS;

VALENCE BAND;

GALLIUM COMPOUNDS;

SPUTTERING;

EID: 0038347266     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00129-4     Document Type: Article

References (9)

1. Gouskov A. Camassel J. Gouskov L. Prog. Cryst. Growth Charact. 5 1982 323
2. P.A. Lee (Ed.), Optical and Electrical Properties of Layered Materials, Reidel, Dordrecht, 1976
3. Di Giulio M. Micocci G. Siciliano P. Tepore A. J. Appl. Phys. 62 1987 4231
4. De Blasi C. Manno D. Micocci G. Tepore A. J. Appl. Phys. 65 1989 1164
5. Gillan E.G. Barron A.R. Chem. Mater. 9 1997 3037
6. Joint Committee on Powder Diffraction Standards, Card 29-628, Swarthmore, PA, 1987
7. Le Comber P.G. Madan A. Spear W.E. J. Non-Cryst. Solids 11 1972 219
8. Pankove J.I. Optical Processes in Semiconductors 1971 Prentice-Hall New Jersey p. 34
9. Manfredotti C. Rizzo A. Bufo A. Cardetta V.L. Phys. Status Solidi a 30 1975 375