Fabrication of polycrystalline diamond film resonators

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3511, Issue , 1998, Pages 169-173

  Wang, Xiaodong ^a   Yang, Yirong ^a   Xie, Jianfang ^a   Wang, Weiyuan ^a   Ren, Congxin ^a  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

Author keywords

Diamond films; Oxygen ion beam etching; Polysilicon sacrificial layer; Resonators

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIAMOND FILMS; DRY ETCHING; ELECTROSTATICS; MICROELECTRONIC PROCESSING; POLYSILICON; SILICON WAFERS; SUBSTRATES;

OXYGEN ION BEAM ETCHING; POLYCRYSTALLINE DIAMOND FILM MICRO-RESONATORS; POLYSILICON SACRIFICIAL LAYER;

RESONATORS;

EID: 0038336261     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.324295     Document Type: Conference Paper

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