High performance and stability reticle writing system, HL-800M

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3412, Issue , 1998, Pages 58-66

  Kadowaki, Yasuhiro ^a   Kawasaki, Katsuhiro ^a   Mizuno, Kazui ^a   Satoh, Hidetoshi ^a   Hoga, Morhisa ^a   Uryu, Ken ^a  

^a HITACHI LTD   (Japan)

Author keywords

3 stage deflector; Accelerated voltage; Continuous moving stage; Multi exposure function; Proximity effect correction; Temperature control system; Variable shaped beam

Indexed keywords

COMPUTER SOFTWARE; DENSITY (OPTICAL); ELECTRON BEAMS; ERROR CORRECTION; FUNCTIONS; PHOTOLITHOGRAPHY; SEMICONDUCTOR DEVICE MANUFACTURE; TEMPERATURE CONTROL; THRESHOLD VOLTAGE; VIBRATIONS (MECHANICAL);

ACCELERATED VOLTAGE; CONTINUOUS MOVING STAGE; ELECTRON BEAM RETICLE WRITING SYSTEM; MULTIEXPOSURE FUNCTION; PROXIMITY EFFECT CORRECTION; TEMPERATURE CONTROL SYSTEM; THREE STAGE DEFLECTOR; VARIABLE SHAPE BEAM;

MASKS;

EID: 0038335883     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.328806     Document Type: Conference Paper

References (3)

1. H.Satoh et al, SPIE Proceedings Vol. 2723, 102(1996)
2. K.Mizuno et al, SPIE Proceedings Vol. 2793, 452(1996)
3. F.Murai, H.Yoda, S.Okazaki, N.Saitou, Y.Sakitani, J. Vac.Sci. Technol. B10(6), Nov.1992