Effects of wavelengths on processing indium tin oxide thin films using diode-pumped Nd:YLF laser

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4830, Issue , 2002, Pages 36-39

  Tanaka, R ^a,b   Takaoka, T ^a,b   Mizukami, H ^c   Arai, T ^c   Iwai, Y ^c  

^a Fukui Industrial Support Center   (Japan)

^b Matsuura Machinery Corporation   (Japan)

^c UNIVERSITY OF FUKUI   (Japan)

Author keywords

Etching; ITO; Nd:YLF laser; Sealed gases; Thin films

Indexed keywords

ATOMIC FORCE MICROSCOPY; GLASS; LASER ABLATION; LIGHT ABSORPTION; PUMPING (LASER); SEMICONDUCTING INDIUM COMPOUNDS; SEMICONDUCTOR LASERS; SUBSTRATES; THIN FILMS;

SEALED GASES;

NEODYMIUM LASERS;

EID: 0038324299     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.486570     Document Type: Conference Paper

References (5)

1. M. Takai, D. Bollmann, K. Haberger, "Maskless patterning of indium tin oxide layer for flat panel displays by diode-pumped Nd:YLF laser irradiation", Appl. Phys. Lett. Vol. 64, No. 19, p2560-2562, 1994.
2. R. Tanaka, T. Takaoka, H. Mizukami, T. Arai, Y. Iwai, "Laser etching of Indium Tin Oxide thin films", 22nd annual meeting of The Laser Society of Japan, 2002.
3. O. Yavas et al., "Effect of substrate absorption on the efficieny of laser patterning of indium tin oxide thin films", Journal of Applied Physics, Vol. 85, No. 8, p4207, 1999.
4. 3 films: Basic optical properties and applications to energy-efficient windows", J. Appl. Phys., 60, R123-159, 1986.
5. Duley, W. W, "UV lasers: effects and applications in materials science", Cambridge University Press, Chapter2, 1996.