Ferromagnetic resonance linewidth in thin films coupled to NiO

Journal of Applied Physics

Volumn 83, Issue 11, 1998, Pages 7037-7039

  McMichael, R D ^a   Stiles, M D ^a   Chen, P J ^a   Egelhoff Jr , W F ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0038299959     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.367725     Document Type: Article

References (12)

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