Minimizing wafer surface damage and chamber material contamination in new plasma processing equipment

Japanese Journal of Applied Physics

Volumn 29, Issue 12, 1990, Pages 2395-2397

  Goto, Haruhiro ^a   Sasaki, Makoto ^a   Ohmi, Tadahiro ^a   Shibata, Tadashi ^a   Yamagaml, Atsushi ^a   Okamura, Nobuyuki ^a   Kamiya, Osamu ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Contamination; Glow discharge; Ion bombardment; Magnetron; Of plasma; Plasma damage; Plasma potential; Self bias voltage

Indexed keywords

EID: 0038281623     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.29.L2395     Document Type: Article

References (3)

1. R. Huddlestone, and S. Leonard, Plasma Diagnostic Techniques Academic Press, New York, 1965 4
2. T. Ohmi, T. Ichikawa, H. Iwabuchi, and T. Shibata, J. Appl, Phys. 66 (1989) 4756
3. P. D. Davidse, and L. I. Maissel, J. Appl. Phys. 37 (1966) 574