Ion beam deposition processes for improved hard bias magnetic and device properties in the abutted junction configuration

Journal of Applied Physics

Volumn 87, Issue 9 III, 2000, Pages 6615-6617

  Devasahayam, Adrian J ^a   Wang, Jinsong ^a   Hedge, Hari ^a  

^a VEECO INSTRUMENTS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0038245078     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.372788     Document Type: Article

References (6)

1. C. H. Bajorek and D. A. Thompson, IEEE Trans. Magn. 11, 1209 (1975).
2. E. W. Hill, A. M. McCullough, and G. R. Hoffman, IEEE Trans. Magn. 22, 683 (1986).
3. M. T. Krounbi, U.S. Patent No. 5 018 037 (1991).
4. M. Xiao, A. J. Devasahayam, and M. H. Kryder, IEEE Trans. Magn. 34, 1945 (1998).
5. H. Hegde, J. Wang, A. J. Devasahayam, S. Bozeman, N. Tabat, P. Anderson, and P. Ryan (unpublished).
6. Q. Leng, M. Mao, L. Miloslavsky, B. Simion, C.-Y. Hung, C. Qian, M. Miller, R. Basi, H. C. Tong, J. Wang, and H. Hegde, J. Appl. Phys. 85, 5843 (1999).