Silicon oxide formation in the disk environment

Journal of Information Storage and Processing Systems

Volumn 2, Issue 1-2, 2000, Pages 125-128

  Kasai, Paul H ^a   Eng, Frederick P ^b  

^a IBM ALMADEN RESEARCH CENTER   (United States)

^b IBM   (United States)

Author keywords

Head disk interface; Silicon Oxide

Indexed keywords

EID: 0038222723     PISSN: 10998047     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (8)

1. Balykova, T.N. and Rode, V.V. (1969), "Progress in the Study of Degradation and Stabilization of Siloxane Polymers," Russian Chem. Rev. 38, 306-317.
2. Kasai, P.H. (1999), "Degradation of Perfluoropoly(ethers) and Role of X-1P Additives in Disk Files," J. Info. Storage Proc. Syst. 1, 23-31.
3. Kucera, M., Lanikova, J., and Jelinek, M. (1961), "Neutralization of Residual Catalyst in Polydimethylsiloxane. Effects of Neutralization on the Thermal Stability of the Polymer," J. Polymer Sci. 53, 301-310.
4. Kucera, M. and Lanikova, J. (1961), "Thermal Stability of Polydimethylsiloxane I. Deactivation of Basic Active Centers," J. Polymer Sci. 54, 375-384.
5. Munk, P. (1989), Introduction to Macromolecular Science, Wiley, New York.
6. Prenosil, M. (1988), "Contamination Control in Disk Drive Development," Res. Develop. May, 100-103.
7. x, and Their Deuterated Analogs," Appl. Spectrosc. 38, 822-834.
8. Yamamoto, T., Takahashi, M., and Shinohara, M. (1991), "Head-Disk Interface," Fujitsu J. Sci. Technol. 26, 415-427.