Metalorganic chemical vapor deposition of antimony oxide films on semiconductor substrates

Inorganic Materials

Volumn 38, Issue 6, 2002, Pages 576-581

  Mittov, O N ^a   Ponomareva, N I ^a   Mittova, I Ya ^a  

^a VORONEZH STATE UNIVERSITY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ALKYL GROUP; ANTIMONY BUTOXIDE; ANTIMONY DERIVATIVE; ANTIMONY OXIDE; ANTIMONY TRI BETA AMINOETHOXIDE; GALLIUM ARSENIDE; METAL COMPLEX; OXIDE; SILICON; TRIETHYLANTIMONY; TRIPROPYLANTIMONY; UNCLASSIFIED DRUG;

ARTICLE; CHEMICAL COMPOSITION; INORGANIC CHEMISTRY; LOW TEMPERATURE; METALLATION; MICROANALYSIS; SEMICONDUCTOR; STRUCTURE ANALYSIS; TEMPERATURE DEPENDENCE; THERMODYNAMICS; VAPORIZATION;

EID: 0038210968     PISSN: 00201685     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1015861418396     Document Type: Article

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