Systematic mismatch in diffusion resistors caused by photolithography

IEEE International Conference on Microelectronic Test Structures

Volumn , Issue , 2002, Pages 247-250

  Hausser, Stefan ^a   Majoni, Stefan ^a   Schligtenhorst, Holger ^a   Kolwe, Georg ^a  

^a NXP SEMICONDUCTORS   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION IN SOLIDS; ELECTRIC RESISTANCE MEASUREMENT; PHOTOLITHOGRAPHY; RESISTORS; SILICON WAFERS;

ACTIVE DEVICES; DIFFUSION RESISTORS; PASSIVE DEVICES; SYSTEMATIC MISMATCH;

CMOS INTEGRATED CIRCUITS;

EID: 0038156974     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)

1. M. Pelgrom, H.P. Tuinhout and M. Vertregt, Proceedings of the IEDM 1998; p. 915 (1998)
2. R. Wittman, W. Schardein, B. Hosticka, G. Burbach, J. Arndt, IEEE Journal of Solid State Circuits; Vol. 30, 935 (1995)
3. M. Pelgrom, IEEE Journal of Solid State Circuits; Vol. 25, 1347 (1990)
4. J. Knol, unpublished report (1996)
5. G. Mirth; Proceedings of the SPIE; Vol. 2635; 268 (1995)
6. E. Bokelberg and J. Goetz; Proceedings of the SPIE; Vol. 2438; 737 (1995)
7. D. Yen; Proceedings of the SPIE; Vol. 342; 73 (1982)
8. R. Leonard; Proceedings of the SPIE; Vol. 275; 187 (1981)
9. M.S. Kim and A. Reiser; Proceedings of the SPIE; Vol. 3049; 528 (1997)