Ion beam modification of photo-induced charge separation in TiO2 films

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 206, Issue , 2003, Pages 245-248

  Sumita, T ^a   Yamaki, T ^b   Yamamoto, S ^b   Miyashita, A ^b  

^a JAPAN AEROSPACE EXPLORATION AGENCY   (Japan)

^b JAPAN ATOMIC ENERGY AGENCY   (Japan)

Author keywords

Charge separation; Depth profile; Ion implantation; Laser ablation; Titanium oxide

Indexed keywords

ANNEALING; CHROMIUM; ENERGY GAP; ION BEAMS; ION IMPLANTATION; LASER ABLATION; PULSED LASER DEPOSITION; SECONDARY ION MASS SPECTROMETRY; TITANIUM DIOXIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

PHOTO-INDUCED CHARGE SEPARATION;

CONDUCTIVE FILMS;

EID: 0038146858     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(03)00730-4     Document Type: Conference Paper

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