Site control of Ga droplet array on CaF2 by surface modification using a focused electron beam

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 12 SUPPL. B, 1996, Pages 6689-6695

  Kawasaki, Koji ^a   Uejima, Kazuya ^a   Tsutsui, Kazuo ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

CaF2; Droplet; Electron beam; Ga; Nanofabrication; Quantum dots; Self organizing; Site control; Surface modification

Indexed keywords

CALCIUM COMPOUNDS; ELECTRON BEAMS; NANOTECHNOLOGY; SEMICONDUCTOR QUANTUM DOTS; SURFACE TREATMENT;

FOCUSED ELECTRON BEAM; SITE CONTROL;

SEMICONDUCTING GALLIUM;

EID: 0038145906     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.6689     Document Type: Article

References (13)

1. R. Notzel, J. Temmyo and T. Tamamura: J. Cryst. Growth 145 (1994) 990.
2. J. Oshinowo, M. Nishioka, S. Ishida and Y. Arakawa: J. Cryst. Growth 145 (1994) 986.
3. J. Ahopelto, A. A. Yamaguchi, K. Nishi, A. Usui and H. Sakai: Jpn. J. Appl. Phys. 32 (1993) L32.
4. K. Mukai, N. Ohtsuka, M. Sugawara and S. Yamazaki: Jpn. J. Appl. Phys. 33 (1994) L1710. Appl. Phys. Lett. 66 (1995) 2364.
5. K. Mukai, N. Ohtsuka, M. Sugawara and S. Yamazaki: Jpn. J. Appl. Phys. 33 (1994) L1710. Appl. Phys. Lett. 66 (1995) 2364.
6. J. N. Randall: Nanotechnology 4 (1993) 41.
7. P. D. Dresselhaus, L. Ji, S. Han, J. E. Lukens and K. K. Likharev: Phys. Rev. Lett. 72 (1994) 3226.
8. K. Nakazato and H. Ahmed: Jpn. J. Appl. Phys. 34 (1995) 700.
9. K. Kawasaki, K. Uejima and K. Tsutsui: Jpn. J. Appl. Phys. 34 (1995) 6846.
10. K. Tsutsui, K. Uejima and K. Kawasaki: Physica B 7277 (1996) 4.
11. N. Koguchi and K. Ishige: Jpn. J. Appl. Phys. 32 (1993) 2052.
12. H. C. Lee, T. Asano, H. Ishiwara and S. Furukawa: J. Appl. Phys. 27 (1988) 1616.
13. K. Kawasaki, K. Tsutsui and S. Furukawa: Jpn. J. Appl. Phys. 33 (1994) 914.