Application of megasonic cleaner to sub-micron particles of SIL optical flying head

Microsystem Technologies

Volumn 9, Issue 4, 2003, Pages 225-231

  Kim, N ^a   Kim, S ^b  

^a Korea University of Technology and Education   (South Korea)

^b LG Electronics Inc   (South Korea)

Author keywords

Contamination; Near field recording (NFR); Solid immersion lens (SIL); Sub micron particles; Ultrasonic cleaning

Indexed keywords

ALUMINA; ATOMIC FORCE MICROSCOPY; CONTAMINATION; LATEXES; MICROSCOPES; OPTICAL DATA STORAGE; OPTICAL INSTRUMENT LENSES; OPTICAL RECORDING; PARTICLE SIZE ANALYSIS; POLYSTYRENES; REMOVAL;

NEAR FIELD RECORDING; OPTICAL FLYING HEAD; OPTICAL SLIDERS; SOLID IMMERSION LENS; SUBMICRON PARTICLES;

ULTRASONIC CLEANING;

EID: 0038137966     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-002-0269-4     Document Type: Article

References (11)

1. Bogy DB; Lu S; O'Hara MA; Zhang S (1998) Some advanced air bearing design issues for proximity recording. Trans ASME 120:566-570
2. Tokuyama M.; Hirose S (1994) Dynamic flying characteristics of magnetic head slider with dust. J Tribology 116: 95-100
3. Kim SK; Kim YS; Kim J-Y; Kim J-H (2001) Technical Digest of ISOM 2001, Taipei, pp 60
4. Koka R; Kumaran AR (1991) Visualization and analysis of particulate build-up on the leading edge taper. Adv Inform Storage Sys 2: 161-171
5. Zhang L; Koka R; Yuen Y (1999) Particle induced damage on head and discs due to fine particles of different materials. IEEE Trans Magnetics 35(2):927-932
6. Qui Q; Brereton GJ (1995) Mechanisms of removal of micron-sized particles by high-frequency ultrasound. IEEE Trans Ultrasonics, Ferroelectronics, and Frequency Controls 42(4):619-629
7. Zang F; Busnaina AA; Fury MA; Wang S (2000) The removal of deformed submicron particles from silicon wafers by spin rinse and megasonics. J Electric Materials 29(2): 199-204
8. Busnaina AA; Elsawy TM (1998) Post-CMP cleaning using acoustic streaming. J Electric Materials 27(10):1095-1098
9. Deymier PA; Kheilif A (2000) Streaming and removal forces in second-order sound field during megasonic cleaning of silicon wafers. J Appl Phy 88(11):6821-6835
10. Zhang S; Wang L; Jones P; Lopatin, G (1999) Numerical and experimental study of the particle contamination in a head/media interface. IEEE Trans Magnetics 35(5):2442-2444
11. Deymier PA; Kheilif A (2000) Theoretical calculation of the acoustic force on a patterned silicon wafer during megasonic cleaning. J Appl Phy 88(5):2423-2429