Investigation of the growth and stability of (1 0 0)[0 0 1] NiO films grown by thermal oxidation of textured (1 0 0)[0 0 1] Ni tapes for coated conductor applications during oxygen exposure from 700 to 1400 °C

Acta Materialia

Volumn 51, Issue 13, 2003, Pages 3759-3768

  Kursumovic, A ^a   Huhne R ^a,b   Tomov, R ^a   Holzapfel, B ^b   Glowacki, B A ^a   Evetts, J E ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b IFW DRESDEN   (Germany)

Author keywords

Crystalline oxides; Nickel; Oxidation; Texture; Thin films

Indexed keywords

EPITAXIAL GROWTH; GRAIN GROWTH; NICKEL COMPOUNDS; NUCLEATION; OXIDATION; RECRYSTALLIZATION (METALLURGY); SINGLE CRYSTALS;

COATED CONDUCTOR APPLICATIONS;

THIN FILMS;

EID: 0038112122     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1359-6454(03)00190-3     Document Type: Article

References (37)

1. Müller H.G. Z. Metallkde. 31:1939;161.
2. Goyal A., Norton D.P., Budai J., Parantharam M., Specht E.D., Kroeger D.M., Christen D.K., Saffian Q., He B., List F.A., Lee D.F., Martin P.M., Klabunde C.E., Hatfield E., Sikka V.K. Appl. Phys. Lett. 69:1996;1795.
3. Hutchinson W.B., Ekström H.-E. Mater. Sci. Technol. 6:1990;1130.
4. De Boer B., Eickemeyer J., Reger N., Fernandez G.-R., Richter J., Holzapfel B., Schultz L., Prusseit W., Berbericht P. Acta Mater. 49:2001;1421.
5. Eickemeyer J., Selbmann D., Opitz R., de Boer B., Holzapfel B., Schutz L., Miller U. Supercond. Sci. Technol. 14:2001;152.
6. Paranthaman M., Lee D.F., Goyal A., Specht E.D., Martin P.M., Cui X., Mathis J.E., Feenstra J., Christen D.K., Kroeger D.M. Supercond. Sci. Technol. 12:1999;319.
7. Tomov R.I., Kursumovic A., Majoros M., Kang D.-J., Glowacki B.A., Evetts J.E. Supercond. Sci. Technol. 15:2002;598.
8. Atkinson H.V. Mater. Sci. Technol. 4:1988;1052.
9. Czerwinski F., Szpunar J.A. Acta Mater. 46:1998;1403.
10. Haugsrud R. Corr. Sci. 44:2002;1569.
11. Ginsbach A., Schneider R., Grueniger H.W., Grabe G. IEEE Trans. Magnetics. 27:1991;1410.
12. Matsumoto K., Kim S.-B., Wen J.-G., Hirabayashi I. IEEE Trans. Appl. Supercond. 9:1999;1539.
13. Lockman Z., Goldacker W., Nast R.B., De Boer B., MacManus-Driscoll J.L. IEEE Trans. Appl. Supercond. 11:2001;3325.
14. Selbmann D., Eickemeyer J., Wandrock H., Jimenez C., Donet S., Weiss F., Miller U., Stadel O. J. Phys. IV France. 11:2001;239.
15. Kofstad P. Nonstoichiometry, diffusion, and electrical conductivity in binary metal oxides. 1972;Wiley-Interscience, New York.
16. Rapp R.A. Met. Trans. A. A15:1984;765.
17. Caplan D., Graham M.J., Cohen M. J. Electrochem. Soc. 119:1972;1205.
18. Graham M.J., Cohen M. J. Electrochem. Soc. 120:1972;879.
19. Czerwinski F., Smeltzer W.W. J. Electrochem. Soc. 140:1993;2606.
20. Kursumovic A., Tomov R., Hühne R., Glowacki B.A., Evetts J.E., Tuissi A., Villa E., Holzapfel B. Physica C. 385:2003;337.
21. Elrefaie F.A., Manolescu A., Smeltzer W.W. J. Electrochem. Soc. 132:1985;2489.
22. Zhang H., Wong H. Acta Mater. 50:2002;1983.
23. Detert K. Haessner F. Recrystallization of metallic materials. 1971;Riederer Verlag GmbH, Stuttgart.
24. Graham M.J., Hussey R.J., Cohen M. J. Electrochem. Soc. 120:1973;1523.
25. Graham M.J., Sproule G.I., Caplan D., Cohen M. J. Electrochem. Soc. 119:1972;883.
26. Herzhl R., Khoi N.N., Homma T., Smeltzer W.W. Oxid. Met. 4:1972;35.
27. Douglas D.L. Corr. Sci. 8:1968;665.
28. Khoi N.N., Smeltzer W.W., Embury J.D. J. Electrochem. Soc. 122:1975;1495.
29. Fueki K., Wagner J.B. Jr. J. Electrochem. Soc. 112:1965;384.
30. Gesmundo F.M. Mat. Sci. Eng. 87:1987;243.
31. Volpe M.L., Reddy J. J. Chem. Phys. 53:1970;1117.
32. Moosa A.A., Rothman S.J. Oxid. Met. 24:1985;133.
33. Wagner C.Z. Z. Physik. Chem. B. B21:1933;25.
34. Wagner C. Atom Movements. 1951;Amer Soc Metals, Cleveland. p. 153.
35. Atkinson A., Taylor R.I. Phil. Mag. A. A39:1979;581.
36. Atkinson A., Taylor R.I. Phil. Mag. A. A43:1981;979.
37. Perrow M., Smelzer W.W., Embury J.D. Acta Metall. 68:1968;1209.