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Volumn 93, Issue 1-3, 2003, Pages 316-320

Modification of metal oxide semiconductor gas sensor by electrophoretic deposition

Author keywords

Coating layer; Electrophoretic deposition; Modification; Semiconductor gas sensor

Indexed keywords

COATINGS; ELECTROPHORESIS; MOS DEVICES; MULTILAYERS;

EID: 0038110879     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-4005(03)00219-3     Document Type: Conference Paper
Times cited : (35)

References (3)
  • 1
    • 0038744730 scopus 로고    scopus 로고
    • Japanese Patent 79-34640 (1979)
    • H. Kitaguchi, Japanese Patent 79-34640 (1979).
    • Kitaguchi, H.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.