Investigations and modelling of physical processes in inorganic resists for the use in UV and laser lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3424, Issue , 1998, Pages 20-27

  Kostyukevych, S A ^a  

^a INSTITUTE OF SEMICONDUCTOR PHYSICS   (Ukraine)

Author keywords

Chalcogenide inorganic resist; Laser lithography; Microlithography

Indexed keywords

DIFFUSION; DOPING (ADDITIVES); GLASS; LASER BEAM EFFECTS; SURFACE PLASMON RESONANCE; THIN FILMS;

INORGANIC RESISTS;

LITHOGRAPHY;

EID: 0038070457     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.323755     Document Type: Conference Paper

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