Future challenges for cleaning in advanced microelectronics

Solid State Phenomena

Volumn 92, Issue , 2003, Pages 1-6

  Bowling, Allen ^a   Kirkpatrick, Brian ^a   Hurd, Trace ^a   Losey, Laura ^a   Matz, Phil ^a  

^a TEXAS INSTRUMENTS   (United States)

Author keywords

Clustered cleaning; New materials cross contamination control; Porous low K cleaning; Silicon wafer cleaning; Single wafer cleaning; Surface preparation

Indexed keywords

CLEANING; CMOS INTEGRATED CIRCUITS; MICROELECTRONICS; SEMICONDUCTOR DEVICE MANUFACTURE; SURFACE TREATMENT; CONTAMINATION; POROUS SILICON;

SILICON WAFER CLEANING; SURFACE PREPARATION; CROSS CONTAMINATION; POROUS LOW-K; SINGLE-WAFER CLEANING; WAFER CLEANING;

SILICON WAFERS;

EID: 0038068876     PISSN: 10120394     EISSN: None     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/ssp.92.1     Document Type: Conference Paper

References (0)