Microstructure characterization of transition films from amorphous to nanocrocrystalline silicon

Journal of Crystal Growth

Volumn 256, Issue 1-2, 2003, Pages 27-32

  Xu, Yanyue ^a   Liao, Xianbo ^a   Kong, Guanglin ^a   Zeng, Xiangbo ^a   Hu, Zhihua ^a   Diao, Hongwei ^a   Zhang, Shibin ^a  

^a INSTITUTE OF SEMICONDUCTORS   (China)

Author keywords

A1. Nanostructures; A2. Growth from vapor; A3. Chemical vapor deposition processes; B2. Semiconducting silicon

Indexed keywords

AMORPHOUS FILMS; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; NANOSTRUCTURED MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SCATTERING; SEMICONDUCTING SILICON;

CRYSTALLINE STATES;

THIN FILMS;

EID: 0038034868     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(03)01342-3     Document Type: Article

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