Fluxes of UV photons to the surface under conditions of plasma etching in chlorine

High Energy Chemistry

Volumn 32, Issue 4, 1998, Pages 267-269

  Balashov, D I ^a  

^a IVANOVO STATE UNIVERSITY OF CHEMISTRY AND TECHNOLOGY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0038014936     PISSN: 00181439     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (3)

1. Danilin, B.S. and Kireev, V.Yu., Primenenie nizkotemperaturnoi plazmy dlya travleniya i ochistki materialov (Application of a Low-Temperature Plasma for Etching and Cleaning Materials), Moscow: Energoatomizdat, 1987.
2. Plasma Processing for VLSI, Einspruch, N. and Brown, D., Eds., New York: Academic, 1984.
3. Translated under the title Plazmennaya tekhnologiya v proizvodstve SBIS, Moscow: Mir, 1987.