Intramolecular nucleophile-induced photorearrangements and silene formation from an o-(methoxymethyl)phenylsilacyclobutane

Journal of the American Chemical Society

Volumn 125, Issue 27, 2003, Pages 8096-8097

  Leigh, William J ^a   Li, Xiaojing ^a  

^a MCMASTER UNIVERSITY   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ACETIC ACID; ACETONE; CYCLOBUTANE DERIVATIVE; ETHER; ETHYLENE; HEXANE; METHANOL; OXYGEN; SILICON;

ARTICLE; CHEMICAL ANALYSIS; CHEMICAL BOND; CHEMICAL INTERACTION; CHEMICAL REACTION; CHEMICAL STRUCTURE; COMPLEX FORMATION; DECOMPOSITION; ISOLATION PROCEDURE; ISOMER; LIGHT; MOLECULE; NUCLEAR MAGNETIC RESONANCE; PHOTOCHEMISTRY; PHOTOLYSIS; REACTION ANALYSIS; SILENE; SYNTHESIS; ULTRAVIOLET SPECTROSCOPY;

EID: 0038006071     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja035283k     Document Type: Article

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