Two-step etching process for small size pattern

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3412, Issue , 1998, Pages 233-236

  Yang, Kenny ^a  

^a Taiwan Mask Corporation   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM; DEFECTS; DRY ETCHING; SPATIAL VARIABLES CONTROL; SPATIAL VARIABLES MEASUREMENT; WETTING;

CRITICAL DIMENSIONAL BIAS; TWO STEP ETCHING;

MASKS;

EID: 0037997934     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.328812     Document Type: Conference Paper

References (0)