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Chemical Physics

Volumn 290, Issue 2-3, 2003, Pages 211-221

Argon matrix isolation study of the thermal and photochemical reaction of OVCl3 with (CH3)2CO

(2) Kayser, David A a Ault, Bruce S a

a UNIVERSITY OF CINCINNATI (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACID; ARGON; BASE; CARBON; HYDROCHLORIC ACID; TRANSITION ELEMENT;

ADDITION REACTION; ARTICLE; CALCULATION; CHEMICAL BOND; DECOMPOSITION; INFRARED SPECTROSCOPY; ISOMERISM; ISOTOPE LABELING; MOLECULAR DYNAMICS; PHOTOCHEMISTRY; THEORETICAL STUDY; THERMAL ANALYSIS;

EID: 0037990106 PISSN: 03010104 EISSN: None Source Type: Journal
DOI: 10.1016/S0301-0104(03)00140-X Document Type: Article

Times cited : (15)

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