Characterization of high-k dielectric films with tunneling AFM

Materials Research Society Symposium - Proceedings

Volumn 738, Issue , 2003, Pages 183-188

  Wang, Xiang Dong ^a   Kulik, Joe ^a   Edwards, N V ^a   Samavedam, S B ^a   Lu, Shifeng ^a  

^a MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; LEAKAGE CURRENTS; PERMITTIVITY; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

LEAKAGE CURRENT CHARACTERIZATION;

DIELECTRIC FILMS;

EID: 0037973558     PISSN: 02729172     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (10)

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