Aspheric surface fabrication in nm-level accuracy by numerically controlled plasma chemical vaporization machining (CVM) and elastic emission machining (EEM)

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4782, Issue , 2002, Pages 265-270

  Yamamura, K ^a   Mimura, H ^a   Yamauchi, K ^a   Sano, Y ^a   Saito, A ^a   Kinoshita, T ^a   Endo, K ^a   Mori, Y ^a   Souvorov, A ^b   Yabashi, M ^b   Tamasaku, K ^c   Ishikawa, T ^c  

^a OSAKA UNIVERSITY   (Japan)

^b JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE   (Japan)

^c RIKEN   (Japan)

Author keywords

Coherent X ray; EEM(Elastic Emission Machining); Elliptical mirror; Kirkpatrick Baez; Microfocusing; Plasma CVM(Chemical Vaporization Machining); X ray mirror

Indexed keywords

CRYSTALLOGRAPHY; MACHINING; REFLECTION; SCANNING; X RAYS;

CHEMICAL VAPORIZATION MACHINING (CVM);

MIRRORS;

EID: 0037964440     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.453749     Document Type: Conference Paper

References (8)

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