Dielectric properties of anodic films formed on sputtering-deposited tantalum in phosphoric acid solution

Thin Solid Films

Volumn 429, Issue 1-2, 2003, Pages 238-242

  Lu, Q ^a   Mato, S ^a   Skeldon, P ^a   Thompson, G E ^a   Masheder, D ^b  

^a UNIVERSITY OF MANCHESTER   (United Kingdom)

^b AVX Ltd   (United Kingdom)

Author keywords

Anodic oxidation; Dielectric properties; Tantalum

Indexed keywords

ANODES; CAPACITANCE; PERMITTIVITY; PHOSPHORIC ACID; TRANSMISSION ELECTRON MICROSCOPY;

ANODIC FILMS;

THIN FILMS;

EID: 0037960188     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)01292-0     Document Type: Article

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