Electrochemical polishing of copper for microelectronic applications

Surface Engineering

Volumn 19, Issue 1, 2003, Pages 11-16

  Huo, J ^a   Solanki, R ^a   McAndrew, James ^b  

^a OREGON HEALTH AND SCIENCE UNIVERSITY   (United States)

^b AIR LIQUIDE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANODIC POLARIZATION; ATOMIC FORCE MICROSCOPY; COPPER; CURRENT DENSITY; DIELECTRIC MATERIALS; INTEGRATED CIRCUIT MANUFACTURE; MICROELECTRONIC PROCESSING; ORGANIC ACIDS; PERMITTIVITY;

HYDROXYETHYLIDENEDIPHOSPHONIC ACID; POLARIZATION CURVE;

ELECTROLYTIC POLISHING;

EID: 0037941600     PISSN: 02670844     EISSN: None     Source Type: Journal    
DOI: 10.1179/026708402225010047     Document Type: Article

References (19)

1. H. F. Walton: J. Electrochem. Soc., 1950, 97, 219-226.
2. P. V. Shigolev: 'Electrolytic and chemical polishing of metals', 2nd edn, 7; 1974, Tel-Aviv, Israel, Freund Publishing House.
3. J. Edwards: J. Electrochem. Soc., 1953, 97, 223C-230C.
4. C. Wagner: J. Electrochem. Soc., 1954, 101, 225-228.
5. M. Novak, A. K. N. Reddy and H. Wroblowa: J. Electrochem. Soc., 1970, 117, 733-737.
6. R. Soutebin and D. Landolt: J. Electrochem. Soc., 1982, 129, 946-953.
7. P. Neufeld and T. Zervas: Surf. Technol., 1979, 8, 129-135.
8. D. Landolt: Electrochim. Acta, 1987, 32, 1-11.
9. R. Soutebin, H. Froidevaux and D. Landolt: J. Electrochem. Soc., 1982, 127, 1096-1100.
10. J. L. Fang and N.J. Wu: J. Electrochem. Soc., 1989, 136, 3800-3803.
11. R. J. Contolini, A. F. Bernhardt and S. T. Mayer: J. Electrochem. Soc., 1994, 141, 2503-2510.
12. Datta et al.: US Patent 5,567,330, 22 October 1996.
13. J. L. Fang, X. Ma and W. Liu: Chem. J. Chinese Univ., 1981, 2, 285-292.
14. M. Paunovic and M. Schlesinger: 'Fundamentals of electrochemical deposition', 73-97; 1998, New York, John Wiley & Sons, Inc.
15. V. A. Dmitriev and E. V. Rzhevskaya: Russian J. Phys. Chem., 1961, 35, 425-429.
16. A. J. Bard, R. Parsons and J. Jordan: 'Standard potentials in aqueous solution', 41, 292; 1985, New York, Marcel Dekker, Inc., International Union of Pure and Applied Chemistry.
17. S. H. Glarum and J. H. Marshall: J. Electrochem. Soc., 1985, 132, 2872-2878.
18. S. H. Glarum and J. H. Marshall: J. Electrochem. Soc., 1985, 132, 2878-2885.
19. L. J. Korb, D. L. Olson and J. R. Davis et al.: 'Metals Handbook', 9th end, Vol. 13, 35; 1978, ASM International, Metals Park, Ohio.