Comparison of diamond nucleation in DC and AC substrate bias mode

Thin Solid Films

Volumn 433, Issue 1-2 SPEC., 2003, Pages 73-77

  Kromka, A ^a,b   Janik J ^b   Balon, F ^b   Kubovic M ^b   Cerven I ^b   Dubravcova V ^b  

^a INSTITUTE OF PHYSICS   (Czech Republic)

^b SLOVAK UNIVERSITY OF TECHNOLOGY   (Slovakia)

Author keywords

AC and DC bias nucleation; Hot filament CVD; Raman spectroscopy

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FILM GROWTH; NUCLEATION; RAMAN SPECTROSCOPY;

DIAMOND NUCLEATION;

DIAMOND FILMS;

EID: 0037939922     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00288-8     Document Type: Conference Paper

References (11)

1. Diamond: Electronic Properties and Application, L.S. Pan, D.R. Kania ed., Kluwer Academic Publisher (1995 Boston).
2. Lee Y.H., Richard P.D., Bachmann K.J., Glass J.T. Mat. Res. Soc. Symp. Proc. 162:1990;119.
3. Wurzinger P., Pongratz P., Gerber J., Ehrhardt H. Diamond Relat. Mater. 5:1996;345.
4. Rodway D., Savage J.A., Whitfield M.D., Jackman R.B., Foord J.S. Diamond Relat. Mater. 6:1997;658.
5. Hörmann F., Schreck M., Stritzker B. Diamond Relat. Mater. 10:2001;1617.
6. Kromka A., Malcher V., cerven I. Acta Physica Slovaca. 51:2001;27.
7. Bühlman S., Blank E., Haubner R., Lux B. Diamond Relat. Mater. 8:1999;194.
8. Heidger S.L. Mat. Res. Soc. Symp. Proc. 383:1995;319.
9. Dillon R.O., Woollam J.A., Katkanant V. Phys. Rev. Part B. 29:1984;3482.
10. Knight D.S., White W.B. J. Mater. Res. 4:1989;385.
11. Wolter S.D., Borst T.H., Vecan A., Kohn E. Appl. Phys. Lett. 68:1996;3558.