Thermoluminescence of aluminum oxide thin films subject to ultraviolet irradiation

Thin Solid Films

Volumn 433, Issue 1-2 SPEC., 2003, Pages 126-130

  Escobar Alarcon L ^a   Villagran E ^a   Camps, E ^a   Romero, S ^a   Villarreal Barajas, J E ^a   Gonzalez P R ^a  

^a INSTITUTO NACIONAL DE INVESTIGACIONES NUCLEARES   (Mexico)

Author keywords

Laser ablation; Thermoluminescence; Thin film

Indexed keywords

ALUMINA; COMPOSITION; FILM GROWTH; LASER ABLATION; NEODYMIUM LASERS; STOICHIOMETRY; THERMOLUMINESCENCE; ULTRAVIOLET RADIATION;

ULTRAVIOLET (UV) IRRADIATION;

THIN FILMS;

EID: 0037939921     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00325-0     Document Type: Conference Paper

References (11)

1. International Commission on Radiation Units and Measurements, Report 56, 1996.
2. Krause M., Topic M., Stiebig H., Wagner H. Phys. Stat. Sol. A. 185:2001;121.
3. Hubler G.K. Chrisey D.B., Hubler G.K. Pulsed Laser Deposition of Thin Films. 1994;John Wiley and Sons, Inc, New York. Chap. 13.
4. Escobar-Alarcón L., Haro-Poniatowski E., Fernández-Guasti M., Afonso C.N., Perea A. Appl. Phys. A. 69:1999;949.
5. Julien C., Haro-Poniatowski E., Camacho-López M.A., Escobar-Alarcón L., Jiménez-Jarquín J. Mater. Sci. Eng. B. 72:2000;36.
6. Escobar-Alarcón L., Villagran M., Haro-Poniatowski E., Alonso J.C., Fernández-Guasti M., Camps E. Appl. Phys. A. 69:1999;s583.
7. Romero S., Fernández M., Murillo G., Berdejo H.M. Nucl. Instr. Meth. Phys. Res. B. 194:2002;164.
8. Gupta A. Chrisey D.B., Hubler G.K. Pulsed Laser Deposition of Thin Films. 1994;John Wiley and Sons, Inc, New York. Chap. 10.
9. Chen L. Chrisey D.B., Hubler G.K. Pulsed Laser Deposition of Thin Films. 1994;John Wiley and Sons, Inc, New York. Chap. 6.
10. Chen R., Mckeever S.W.S. Theory of Thermoluminescence and Related Phenomena. 1997;World Scientific, Singapore.
11. Chen R. Kinetics of thermoluminescence glow peaks. Horowitz Y.S. Thermoluminescence and Thermoluminescent Dosimetry. 1984;CRC Press, Boca Raton.