Comparative study of W-plug, Al-plug and Al-dual damascene for 0.18 μm ULSI multilevel interconnect technologies

Proceedings of the IEEE 1998 International Interconnect Technology Conference, IITC 1998

Volumn 1998-June, Issue , 1998, Pages 140-142

  Kikuta, K ^a   Takewaki, T ^a   Kakuhara, Y ^a   Fujii, K ^a   Hayashi, Y ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALIGNMENT; ELECTROMIGRATION; ULSI CIRCUITS;

COMPARATIVE STUDIES; DUAL DAMASCENE; DUAL DAMASCENE INTERCONNECT; DUAL DAMASCENE INTERCONNECTS; HIGHLY RELIABLE; INTERCONNECT TECHNOLOGY; MULTI LEVEL INTERCONNECTS; VIA RESISTANCE;

INTEGRATED CIRCUIT INTERCONNECTS;

EID: 0037936516     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IITC.1998.704773     Document Type: Conference Paper

References (1)

1. K. Kikuta et. al., 1993 IEDM, p. 285.