Plasma anti-reflective coating optimization using enhanced reflectivity modeling

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3050, Issue , 1997, Pages 194-204

  Lucas, Kevin D ^a   Vasquez, Jamie A ^a   Jain, Ajay ^a   Filipiak, Stanley M ^a   Vuong, Tam ^a   King, Charles F ^a   Roman, Bernard J ^a  

^a MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CAVITY RESONATORS; FILMS; INORGANIC COATINGS; OPTICAL PROPERTIES; OPTIMIZATION; PLASMA DEPOSITION; PLASMAS; PROCESS CONTROL; REFLECTION;

ANTI-REFLECTIVE COATINGS; COMPLEX FILMS; DEPOSITION CONDITIONS; IMPROVED METHODS; MODELING METHODS; PLASMA ARCS; SUBSTRATE REFLECTIVITIES;

REFLECTIVE COATINGS;

EID: 0037936499     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.275918     Document Type: Conference Paper

References (4)

1. Tohru Ogawa et. al. Proc. of SPIE Microlithography Vol. 2197, 1994, pp 722.
2. John Sturtevant, Bernard J. Roman. Microlithography World, Autumn 1995, pp 13.
3. Eugene Hecht. Optics, Addison-Wesley, Reading, Mass., 1990, pp. 373-378.
4. Kevin Lucas, Andrzej Strojwas. Proc. of IEDM Technical Digest, 1992, pp 177.