Thermal resistance of thin diamond films deposited at low temperatures

Applied Physics Letters

Volumn 69, Issue 11, 1996, Pages 1562-1564

  Verhoeven, H ^a   Reiss H ^a   Fußer H J ^a   Zachai, R ^a  

^a DAIMLER AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0037924264     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.117062     Document Type: Article

References (13)

1. M. Seal, Diam. Relat. Mater. 1, 1075 (1992).
2. A. Katz, F. Baiocchi, E. Lane, C. H. Lee, C. Hall, J. Doting, C. Grijsbach, and K. Harris, J. Appl. Phys. 75, 563 (1994).
3. K. E. Goodson, Ann. Rev. Heat Transfer 6, 323 (1995).
4. J. E. Graebner, Diam. Films Technol. 3, 77 (1993).
5. K. E. Goodson, O. W. Käding, M. Rösler, and R. Zachai, J. Appl. Phys. 77, 1385 (1995).
6. K. E. Goodson, O. W. Käding, M. Rösler, and R. Zachai, Appl. Phys. Lett. 66, 3134 (1995).
7. D. L. Youchison, C. R. Eddy, Jr., and B. D. Sartwell, J. Vac. Sci. Technol. A 11, 103 (1993).
8. Y. Muranaka, H. Yamashita, and H. Miyadera, Diam. Films. Technol. 5, 1 (1995).
9. O. W. Käding, M. Rösler, R. Zachai, H.-J. Füßer, and E. Matthias, Diam. Relat. Mater. 3, 1178 (1994).
10. G. Dollinger, A. Bergmaier, C. M. Frey, M. Rösler, and H. Verhoeven, Diam. Relat. Mater. 4, 591 (1995).
11. B. R. Stoner, G.-H. M. Ma, S. D. Wolter, and J. T. Glass, Phys. Rev. B 45, 11067 (1992).
12. E. T. Swartz and R. O. Pohl, Rev. Mod. Phys. 61, 605 (1989).
13. O. W. Käding, H. Skurk, and K. E. Goodson, Appl. Phys. Lett. 65, 1629 (1994).