Acceleration effect of electroless nickel deposition by Thiourea

International Journal of Chemical Kinetics

Volumn 28, Issue 4, 1996, Pages 259-264

  Han, Ke Ping ^a   Fang, Jing Li ^a  

^a NANJING UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0037918873     PISSN: 05388066     EISSN: None     Source Type: Journal    
DOI: 10.1002/(sici)1097-4601(1996)28:4<259::aid-kin3>3.0.co;2-u     Document Type: Article

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