Reductive photo-patterning of conjugated thin films

Synthetic Metals

Volumn 138, Issue 1-2, 2003, Pages 85-87

  Pogantsch, A ^a   Trattnig, G ^a   Zojer, E ^a   Tillmann, H ^b   Horhold H H ^b   Scherf, U ^c   Langer, G ^d   Kern, W ^d  

^a GRAZ UNIVERSITY OF TECHNOLOGY   (Austria)

^b FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

^c UNIVERSITY OF POTSDAM   (Germany)

^d GRAZ UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

Light emitting devices; Photo pattern; Polyfluorene

Indexed keywords

CHEMICAL BONDS; DERIVATIVES; HYDRAZINE; HYDROGENATION; LIGHT EMITTING DIODES; LIGHTING; OPTOELECTRONIC DEVICES; ORGANIC POLYMERS; OXIDATION; ULTRAVIOLET RADIATION;

PHOTO-PATTERNING;

THIN FILMS;

EID: 0037902154     PISSN: 03796779     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0379-6779(02)01315-2     Document Type: Conference Paper

References (11)

1. Burroughes J.H., Bradley D.D.C., Brown A.R., Marks R.N., Mackay K., Friend R.H., Burn P.L., Holmes A.B. Nature. 347:1990;539 Braun D., Heeger A.J. Appl. Phys. Lett. 62(6):1992;385.
2. Burroughes J.H., Bradley D.D.C., Brown A.R., Marks R.N., Mackay K., Friend R.H., Burn P.L., Holmes A.B. Nature. 347:1990;539 Braun D., Heeger A.J. Appl. Phys. Lett. 62(6):1992;385.
3. Tada K., Onoda M., Nakayama H. Jpn. J. Appl. Phys. 37:1998;L1181.
4. Wenner R.P., Beckman A.O. J. Am. Chem. Soc. 54:1932;2787 Ramsay D.A. J. Phys. Chem. 57:1953;415 Hussin D., Norrish R.G.W. Proc. R. Soc. London Ser. A. 273:1963;145 Arvis M., Devillers C., Gillois M., Curat M. J. Phys. Chem. 78:1974;1356 Vaghijani G.L. J. Chem. Phys. 98(3):1993;2123.
5. Wenner R.P., Beckman A.O. J. Am. Chem. Soc. 54:1932;2787 Ramsay D.A. J. Phys. Chem. 57:1953;415 Hussin D., Norrish R.G.W. Proc. R. Soc. London Ser. A. 273:1963;145 Arvis M., Devillers C., Gillois M., Curat M. J. Phys. Chem. 78:1974;1356 Vaghijani G.L. J. Chem. Phys. 98(3):1993;2123.
6. Wenner R.P., Beckman A.O. J. Am. Chem. Soc. 54:1932;2787 Ramsay D.A. J. Phys. Chem. 57:1953;415 Hussin D., Norrish R.G.W. Proc. R. Soc. London Ser. A. 273:1963;145 Arvis M., Devillers C., Gillois M., Curat M. J. Phys. Chem. 78:1974;1356 Vaghijani G.L. J. Chem. Phys. 98(3):1993;2123.
7. Wenner R.P., Beckman A.O. J. Am. Chem. Soc. 54:1932;2787 Ramsay D.A. J. Phys. Chem. 57:1953;415 Hussin D., Norrish R.G.W. Proc. R. Soc. London Ser. A. 273:1963;145 Arvis M., Devillers C., Gillois M., Curat M. J. Phys. Chem. 78:1974;1356 Vaghijani G.L. J. Chem. Phys. 98(3):1993;2123.
8. Wenner R.P., Beckman A.O. J. Am. Chem. Soc. 54:1932;2787 Ramsay D.A. J. Phys. Chem. 57:1953;415 Hussin D., Norrish R.G.W. Proc. R. Soc. London Ser. A. 273:1963;145 Arvis M., Devillers C., Gillois M., Curat M. J. Phys. Chem. 78:1974;1356 Vaghijani G.L. J. Chem. Phys. 98(3):1993;2123.
9. Pfeiffer S., Hörhold H.-H. Macromol. Chem. Phys. 200:1999;1870.
10. Choong V.E., Park Y., Hsieh B.R., Gao Y. Phys. Rev. B. 55(23):1997;15460.
11. A. Pogantsch, G. Trattnig, G. Langer, W. Kern, R. Guentner, U. Scherf, H. Tillmann, H.-H. Hörhold, E. Zojer, 2002, submitted for publication.