Photomask blanks enhancement by optimizing resist baking and coating for advanced e-beam reticle fabrication

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2793, Issue , 1996, Pages 78-95

  Higuchi, Takao ^a   Kobayashi, Hideo ^a   Yamashiro, Kazuhide ^a   Asakawa, Keishi ^a   Yokoya, Yasunori ^a  

^a HOYA CORPORATION   (Japan)

Author keywords

Coating thickness; Electron beam resist; Linearity; Pattern edge roughness; Photomask blanks; Process latitude; Reticle; Soft baking; Thin resist

Indexed keywords

FABRICATION; MASKS; OPTICAL INSTRUMENTS; PHOTOLITHOGRAPHY; PHOTOMASKS; POLYMERS; THICKNESS MEASUREMENT; X RAYS;

COATING THICKNESS; ELECTRON BEAM RESIST; LINEARITY; PATTERN EDGE ROUGHNESS; PHOTOMASK BLANKS; PROCESS LATITUDES; RETICLE; SOFT-BAKING; THIN RESIST;

PLASTIC COATINGS;

EID: 0037871440     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.245209     Document Type: Conference Paper

References (15)

1. Overview of current and future reticle processing systems and system improvements that will enable the reticle manufacturer to meet future needs. Kathy S. Miner, SPIE Vol. CR51.
2. Further work in optimizing PBS : Is it capable ofmeeting specifications for 256 Mbit DRAM reticle manufacturing? Robert Dean, Charles Sauer, SPIE Vol. 2621.
3. Evaluation ofthin PBS resist film for improved feature linearity. Larry Davis, et.al., SPIE Vol. 2612.
4. Novel technique on photomask blanks enhancement for the laser reticle writer, Hideo Kobayashi, et.al, SPIE Vol. 2621.
5. PBS; Poly(butene-1-sulfone) is a product and trademark of CHISSO Corporation.
6. EBR-9, EBR-9 HS31 and EBR-900 M-1 are products and trademarks of Toray Industries, Inc.
7. ZEP81O and ZEP7000 are products and trademarks of Nippon Zeon Co., LTD.
8. TM-005 is a product and trademark of Canon sales Co.
9. HLS-8000 is a product and trademark of TOSOH.
10. ELS-3700 is a product and trademark of ELIONIX INC.
11. KLA-2l9 is a product and trademark of KLA Instruments Corporation.
12. MAP-2B is a product and trademark of Nikon.
13. EQZ50O92CAR3∗ and EHQZ5O092CAR3∗ are products and trademarks of HOYA Corporation.
14. MEBES is a trademark of Etec Systems, Inc.
15. JBX is a trademark of JEOL, Inc.