Screening the high-k layer quality by means of open circuit potential analysis and wet chemical etching

Materials Research Society Symposium - Proceedings

Volumn 745, Issue , 2002, Pages 15-20

  Claes, Martine ^a   De Gendt, Stefan ^a   Witters, Thomas ^a   Kaushik, Vidya ^a   Chen, Jerry ^a   Conard, Thierry ^a   Delabie, Annelies ^a   Van Elshocht, Sven ^a   Heyns, Marc ^a  

^a IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTAL DEFECTS; CRYSTALLIZATION; ELECTRODEPOSITION; ETCHING; HAFNIUM COMPOUNDS; SCANNING ELECTRON MICROSCOPY;

WET CHEMICAL ETCHING;

DIELECTRIC MATERIALS;

EID: 0037841972     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-745-n1.8     Document Type: Conference Paper

References (10)

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6. S. Van Elshocht et al., in Novel Materials and Processes for advanced CMOS, edited by J-P. Maria, S. Stemmer, S. De Gendt and M. Gardner (Mater. Res. Soc. Proc., 745, Pittsburgh PA, 2002 (this meeting)).
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