Cross-shaped bandpass filters for the near and mid-infrared wavelength regions

Applied Optics

Volumn 35, Issue 31, 1996, Pages 6210-6215

  Moller K D ^a   Warren, J B ^b   Heaney, J B ^c   Kotecki, C ^c  

^a NEW JERSEY INSTITUTE OF TECHNOLOGY   (United States)

^b BROOKHAVEN NATIONAL LABORATORY   (United States)

^c NASA GODDARD SPACE FLIGHT CENTER   (United States)

Author keywords

Bandpass filters produced by photolithography; Infrared filters

Indexed keywords

EID: 0037793994     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.35.006210     Document Type: Article

References (6)

1. R. Ulrich, “Far-infrared properties of metallic mesh and its complementary structure,” Infrared Phys. 7, 37-55 (1967).
2. R. Ruprecht and W. Bacher, “Untersuchungen an mikrostrukturierten Bandpassfiltern fur das Ferne Infrarot und ihre Herstellung durch Rontgentiefenlithographie und Mikrogalvanoformung,” Inst. Mikrostrukurtech. Kernforschungszentrum Karlsruhe KfK 4825, 1-83 (1991).
3. L. A. Page, E. S. Cheng, B. Golubovic, J. Gundersen, and S. S. Meyer, “Millimeter-submillimeter wavelength filter system,” Appl. Opt. 33, 11-23 (1994).
4. R. C. Compton, R. C. Mcphedran, G. H. Derrick, and L. C. Botten, “Diffraction properties of a bandpass grid,” Infrared Phys. 23, 239-245 (1983).
5. S. T. Chase and R. D. Joseph, “Resonant array bandpass filters for the far infrared,” Appl. Opt. 22, 1775-1779 (1983).
6. D. W. Porterfield, J. L. Hesler, R. Densing, E. R. Mueller, T. W. Crowe, and R. M. Weikle, “Resonant metal-mesh bandpass filters for the far infrared,” Appl. Opt. 33, 6046-6052 (1994).