Composition and energy of the flux of positive and negative ions during reactive magnetron sputter deposition of Ti-C:H films

Surface and Coatings Technology

Volumn 169-170, Issue , 2003, Pages 53-56

  Mišina, Martin ^a  

^a INSTITUTE OF PHYSICS   (Czech Republic)

Author keywords

Argon; Magnetron; Methane; Reactive sputtering; Titanium carbide

Indexed keywords

COMPOSITION; INERT GASES; IONS; MAGNETRON SPUTTERING; MASS SPECTROMETRY; MIXTURES; SPUTTER DEPOSITION;

REACTIVE MAGNETRON SPUTTERING;

METALLIC FILMS;

COATING; ENERGY; FILM; ION IMPLANTATION; SPUTTERING; SURFACE TREATMENT;

EID: 0037793251     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00084-7     Document Type: Article

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