AlN formation and enhancement of high-temperature oxidation resistance by plasma-based ion implantation

Surface and Coatings Technology

Volumn 169-170, Issue , 2003, Pages 359-362

  Hara, Yoshihito ^a   Yamanishi, Tetsuji ^a   Azuma, Kingo ^a   Uchida, Hitoshi ^a   Yatsuzuka, Mitsuyasu ^a  

^a UNIVERSITY OF HYOGO   (Japan)

Author keywords

AES; Aluminum casting alloy (Al 7Si); Aluminum nitride; Oxidation resistance; Plasma based ion implantation; SGAXRD

Indexed keywords

ALUMINUM ALLOYS; ION IMPLANTATION; NITROGEN; PLASMAS; THERMAL EFFECTS;

PULSE VOLTAGE;

OXIDATION RESISTANCE;

COATING; ION IMPLANTATION; NITROGEN; OXIDATION; PLASMA TREATMENT; SURFACE TREATMENT;

EID: 0037792936     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00114-2     Document Type: Article

References (5)

1. Conrad J.R. Radtke J.L. Dodd R.A. Worzala F.J. Tran N.C. J. Appl. Phys. 64 1987 4591
2. Morita R. Azuma K. Inoue S.et al. Surf. Coat. Technol. 136 2001 207
3. Yatsuzuka M. Miki S. Morita R. Azuma K. Fujiwara E. Uchida H. Vacuum 59 2000 330
4. Yamanishi T. Hara Y. Morita R. Azuma K. Fujiwara E. Yatsuzuka M. Surf. Coat. Technol. 136 2001 223
5. Y. Hara, T. Yamanishi, K. Azuma, H. Uchida, M. Yatsuzuka, Surf. Coat. Technol., in press