Field-induced cation migration in Cu oxide films by in situ scanning tunneling microscopy

Applied Physics Letters

Volumn 82, Issue 26, 2003, Pages 4672-4674

  Singh, J P ^a   Lu, T M ^a   Wang, G C ^a  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; COPPER OXIDES; DIFFUSION; ELECTRIC FIELDS; EVAPORATION; MELTING; MORPHOLOGY; OXIDATION; POSITIVE IONS; SCANNING TUNNELING MICROSCOPY; SURFACES;

SURFACE DIFFUSION;

METALLIC FILMS;

EID: 0037767854     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1586461     Document Type: Article

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