Reaction patterning of YBa2Cu3O7-δ thin films on Si

Applied Physics Letters

Volumn 57, Issue 23, 1990, Pages 2504-2506

  Fork, D K ^a,b   Barrera, A ^b   Geballe, T H ^b   Viano, A M ^a,c   Fenner, D B ^a,c  

^a PALO ALTO RESEARCH CENTER   (United States)

^b STANFORD UNIVERSITY   (United States)

^c SANTA CLARA UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0037759382     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.104181     Document Type: Article

References (11)