Diagnostics of neutral species in the low-angle forward-reflected neutral beam etching system

Surface and Coatings Technology

Volumn 171, Issue 1-3, 2003, Pages 231-236

  Chung, M J ^a   Lee, D H ^a   Yeom, G Y ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

Neutral beam; Quadrupole mass spectrometer; SF6

Indexed keywords

CURRENT DENSITY; ELECTRIC POTENTIAL; IONS;

REACTIVE IONS;

REACTIVE ION ETCHING;

ETCHING;

EID: 0037706777     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00277-9     Document Type: Article

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