Bringing down NRE

IEEE Design and Test of Computers

Volumn 20, Issue 3, 2003, Pages 110-111

  Kahng, Andrew B ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COSTS; CURRENT DENSITY; ELECTRON BEAM LITHOGRAPHY; LOGIC DESIGN; MASKS; PHOTORESISTS; PRODUCTION ENGINEERING; THROUGHPUT;

NONRECURRING ENGINEERING (NRE);

INTEGRATED CIRCUIT LAYOUT;

EID: 0037706749     PISSN: 07407475     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Review

References (1)

1. M.D. Levenson et al., "Phase Phirst! An Improved Strong-PSM Paradigm," Proc. 20th Ann. BACUS Symp, Photomask Technology, SPIE, 2000, vol. 4186, pp. 395-404.