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Volumn 90, Issue 6, 2003, Pages 46-51

Direct & pulse current electrodeposition of iron group thin film alloys containing vanadium

(3) Schwartz, M a Arcos, C a Nobe, Ken a

a University of California (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BINARY ALLOYS; CORROSION RESISTANCE; CURRENT DENSITY; IRON ALLOYS; MAGNETIC MOMENTS; PH EFFECTS; SUBSTITUTION REACTIONS; TERNARY SYSTEMS; THIN FILMS; VANADIUM;

PULSE CURRENT (PC) ELECTRODEPOSITION;

ELECTRODEPOSITION;

EID: 0037703304 PISSN: 03603164 EISSN: None Source Type: Trade Journal
DOI: None Document Type: Article

Times cited : (9)

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