Correlation between structural and transport properties of silicon thin films deposited at various substrate temperatures

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 3, 2003, Pages 1048-1054

  Roy, D ^a,c   Das, Chandan ^b   Longeaud, C ^a   Houze F ^a   Ray, S ^b  

^a UNIV PARIS SUD   (France)

^b DEPARTMENT OF MATERIALS SCIENCE   (India)

^c JHARGRAM RAJ COLLEGE   (India)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION IN SOLIDS; GRAIN SIZE AND SHAPE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON; SUBSTRATES; TRANSPORT PROPERTIES;

HYDROGEN DILUTION;

THIN FILMS;

EID: 0037698046     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1570851     Document Type: Article

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