Superconducting coplanar nanolines with 50 nm linewidth

Microelectronic Engineering

Volumn 67-68, Issue , 2003, Pages 363-368

  Weimann, Th ^a   Hinze, P ^a   Wunsch S ^b   Scherer, T A ^b   Jutzi, W ^b   Niemeyer, J ^a  

^a PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

^b UNIVERSITY OF KARLSRUHE   (Germany)

Author keywords

Dry etching; E beam lithography; Nanowire; Superconductivity; Waveguide

Indexed keywords

DRY ETCHING; ELECTRON BEAM LITHOGRAPHY; MICROWAVES; SUPERCONDUCTING MATERIALS; SUPERCONDUCTIVITY; WAVEGUIDES;

SUPERCONDUCTING WAVEGUIDES;

MICROELECTRONICS;

EID: 0037683091     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00091-1     Document Type: Conference Paper

References (5)

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