Magnetron sputtering electrode on the BaTiO3-based PTCR ceramics and the effect of heat treatment on their properties

Materials Science and Engineering: B

Volumn 99, Issue 1-3, 2003, Pages 516-519

  Hao, Yongde ^a   Zhao, Jiaqiang ^a   Zheng, Yike ^a   Gong, Shuping ^a   Zhou, Dongxiang ^a  

^a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

BaTiO3 based PTCR ceramics; Heat treatment; Ni film; Sputtering electrode

Indexed keywords

CERAMIC MATERIALS; ELECTRODES; HEAT TREATMENT; MAGNETRON SPUTTERING; OHMIC CONTACTS; THERMISTORS;

MOIST-HOT ENVIRONMENTS;

BARIUM TITANATE;

EID: 0037672776     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(02)00519-6     Document Type: Conference Paper

References (5)

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2. Qu X.X., Yang B.C., Jiang J.J., Zhang H.W. Electronic Thin-film Materials. 1996;1267 Science Press, Beijing.
3. Chen B.Q. Ion Plating and Sputtering Technology. 1990;26-57 National Defence Industry Press, Beijing.
4. C.S. Sun, Thin Film Technology and Application, North-East University Press, Shenyang, 1998, pp. 1-27, 68-84.
5. D.F. Wu, et al., Ohmic Contacts Principle, Testing and Technics of Metal-semiconductor Interface, Shanghai Jiao Tong University Press, Shanghai, 1989, pp. 1-4, 76.